Sputtering Physics

116 books
Glow discharge processesBrian N. Chapman
⏱ 6h 46m

Glow discharge processes

Brian N. Chapman

1980406 pp.
Handbook of sputter deposition technologyKiyotaka Wasa
⏱ 8h 8m

Handbook of sputter deposition technology

Kiyotaka Wasa

1992488 pp.
Sputtering by Particle Bombardment IIR. Behrisch
⏱ 6h 52m

Sputtering by Particle Bombardment II

R. Behrisch

2013412 pp.
Sputtering by particle bombardmentKlaus Wittmaack
⏱ 6h 58m

Sputtering by particle bombardment

Klaus Wittmaack

1991418 pp.
Yield, energy and angular distributions of sputtered atomsC. H. Weijsenfeld
⏱ 1h 52m

Yield, energy and angular distributions of sputtered atoms

C. H. Weijsenfeld

1966112 pp.
Scanning-electron-microscopy observations and mechanical characteristics of ion-beam-sputtered surgical implant aloysAlbert J. Weigand
⏱ 31m

Scanning-electron-microscopy observations and mechanical characteristics of ion-beam-sputtered surgical implant aloys

Albert J. Weigand

197731 pp.
SputteringUnknown Author
⏱ 3h 14m

Sputtering

Unknown Author

2004194 pp.
Sputtering by Particle BombardmentRainer Behrisch
⏱ 8h 29m

Sputtering by Particle Bombardment

Rainer Behrisch

2010509 pp.
Energy dependence of ion-induced sputtering yields from monoatomic solids at normal incidenceYasunori Yamamura
⏱ 1h 50m

Energy dependence of ion-induced sputtering yields from monoatomic solids at normal incidence

Yasunori Yamamura

1994110 pp.
Computer simulation and data compilation of sputtering yield by hydrogen isotopes (1H+, 2D+, 3T+) and Helium (4He+) ion impact from monatomic solids at normal incidenceYasunori Yamamura
⏱ 51m

Computer simulation and data compilation of sputtering yield by hydrogen isotopes (1H+, 2D+, 3T+) and Helium (4He+) ion impact from monatomic solids at normal incidence

Yasunori Yamamura

199551 pp.
Atomic ejection in the single crystal sputtering of nickel with 40-600 eV argon ionsYee Kit Leung
⏱ 1h 3m

Atomic ejection in the single crystal sputtering of nickel with 40-600 eV argon ions

Yee Kit Leung

197563 pp.
Modeling of life limiting phenomena in the discharge chamber of an electron bombardment ion thrusterArvind K. Handoo

Modeling of life limiting phenomena in the discharge chamber of an electron bombardment ion thruster

Arvind K. Handoo

1991No page data
A study of the angular distribution and preferential sputtering of multicomponent materialsSteven M. Frank
⏱ 1h 44m

A study of the angular distribution and preferential sputtering of multicomponent materials

Steven M. Frank

1989104 pp.
CIP 79Colloque international de pulvérisation cathodique et ses applications (3rd 1979 Nice, France)
⏱ 8h 56m

CIP 79

Colloque international de pulvérisation cathodique et ses applications (3rd 1979 Nice, France)

1979536 pp.
Plasma Etching Processes for Interconnect Realization in VLSINicolas Posseme
⏱ 2h 8m

Plasma Etching Processes for Interconnect Realization in VLSI

Nicolas Posseme

2015128 pp.
Scanning-electron-microscopy observations and mechanical characteristics of ion-beam-sputtered surgical implant aloysAlbert J Weigand
⏱ 31m

Scanning-electron-microscopy observations and mechanical characteristics of ion-beam-sputtered surgical implant aloys

Albert J Weigand

197731 pp.
X-ray photoelectron spectroscopy study of radiofrequency-sputtered refractory-compound--steel interfacesDonald R. Wheeler
⏱ 17m

X-ray photoelectron spectroscopy study of radiofrequency-sputtered refractory-compound--steel interfaces

Donald R. Wheeler

197817 pp.
Sputtered Thin FilmsFrederick Madaraka Mwema
⏱ 3h 16m

Sputtered Thin Films

Frederick Madaraka Mwema

2021196 pp.
Symposium IonenzerstäubungSymposium Ionenzerstäubung Karl-Marx-Stadt, Ger. 1973.
⏱ 4h 57m

Symposium Ionenzerstäubung

Symposium Ionenzerstäubung Karl-Marx-Stadt, Ger. 1973.

1973297 pp.
Reactive sputtering applied to microelectronic devicesTorbjörn Larsson
⏱ 20m

Reactive sputtering applied to microelectronic devices

Torbjörn Larsson

198820 pp.
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