Semiconductors Etching

78 books

Proceedings of the Ninth Symposium on Plasma ProcessingMo.) Symposium on Plasma Processing (9th 1992 Saint Louis

⏱ 10h 54m

Proceedings of the Ninth Symposium on Plasma Processing

Mo.) Symposium on Plasma Processing (9th 1992 Saint Louis

1992654 pp.

Plasma processingSymposium on Plasma Etching and Deposition (1980 Hollywood, Fla.)

⏱ 5h 36m

Plasma processing

Symposium on Plasma Etching and Deposition (1980 Hollywood, Fla.)

1981336 pp.

Plasma Processing of SemiconductorsP.F. Williams

⏱ 10h 28m

Plasma Processing of Semiconductors

P.F. Williams

1997628 pp.

Plazmokhimicheskoe i ionno-khimicheskoe travlenie mikrostrukturV. I͡U Kireev

⏱ 2h 4m

Plazmokhimicheskoe i ionno-khimicheskoe travlenie mikrostruktur

V. I͡U Kireev

1983124 pp.

Advanced Etch Technology for Nanopatterning VISebastian Engelmann

⏱ 3h 16m

Advanced Etch Technology for Nanopatterning VI

Sebastian Engelmann

2018196 pp.

Silicon MicromachiningM. Elwenspoek

⏱ 6h 59m

Silicon Micromachining

M. Elwenspoek

2004419 pp.

Secondes Journées d'études sur la gravure sèche en microélectroniqueJournées d'études sur la gravure sèche en microélectronique (2nd 1983 Grenoble, France)

⏱ 4h 30m

Secondes Journées d'études sur la gravure sèche en microélectronique

Journées d'études sur la gravure sèche en microélectronique (2nd 1983 Grenoble, France)

1983270 pp.

Plasma processes for semiconductor fabricationW. Nicholas G. Hitchon

⏱ 3h 41m

Plasma processes for semiconductor fabrication

W. Nicholas G. Hitchon

1999221 pp.

Studies of thin film plasma processes for microelectronic device manufacturingAnna M. Barklund

⏱ 43m

Studies of thin film plasma processes for microelectronic device manufacturing

Anna M. Barklund

199243 pp.

Materials modification by energetic atoms and ionsMaterials Research Society. Meeting Symposium.

⏱ 6h 45m

Materials modification by energetic atoms and ions

Materials Research Society. Meeting Symposium.

1992405 pp.

Plasma Etching for CMOS Devices RealizationNicolas Posseme

⏱ 2h 16m

Plasma Etching for CMOS Devices Realization

Nicolas Posseme

2017136 pp.

In-situ patterningR. Rosenberg

⏱ 8h 16m

In-situ patterning

R. Rosenberg

1990496 pp.

Dry etch technologyUnknown Author

⏱ 3h 42m

Dry etch technology

Unknown Author

1991222 pp.

Chemistry and lithographyUzodinma Okoroanyanwu

⏱ 14h 52m

Chemistry and lithography

Uzodinma Okoroanyanwu

2010892 pp.

Fiziko-khimicheskie metody obrabotki poverkhnosti poluprovodnikovUnknown Author

Fiziko-khimicheskie metody obrabotki poverkhnosti poluprovodnikov

Unknown Author

No page data

1997 2nd International Symposium on Plasma Process-Induced DamageInternational Symposium on Plasma Process-Induced Damage (2nd 1997 Monterey, Calif.)

⏱ 4h 19m

1997 2nd International Symposium on Plasma Process-Induced Damage

International Symposium on Plasma Process-Induced Damage (2nd 1997 Monterey, Calif.)

1997259 pp.

Plasma etching processes for sub-quarter micron devicesG. S. Mathad

⏱ 6h 18m

Plasma etching processes for sub-quarter micron devices

G. S. Mathad

2000378 pp.

Proceedings of the Symposium on Etching for Pattern DefinitionSymposium on Etching for Pattern Definition (1976 Washington, D.C.)

⏱ 3h 23m

Proceedings of the Symposium on Etching for Pattern Definition

Symposium on Etching for Pattern Definition (1976 Washington, D.C.)

1976203 pp.

Plasma etching in semiconductor fabricationRuss A. Morgan

⏱ 4h 10m

Plasma etching in semiconductor fabrication

Russ A. Morgan

1985250 pp.

In-Situ Patterning : : Volume 158Anthony F. Bernhardt

⏱ 8h 40m

In-Situ Patterning : : Volume 158

Anthony F. Bernhardt

2014520 pp.

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