Electrodiffusion

32 books
Electrotransport in metals and alloysJohn N. Pratt
⏱ 3h 22m

Electrotransport in metals and alloys

John N. Pratt

1973202 pp.
Ėlektrodiffuzionnai͡a︡ diagnostika techeniĭ v suspenzii͡a︡kh i polimernykh rastvorakhN. A. Pokryvaĭlo
⏱ 3h 49m

Ėlektrodiffuzionnai͡a︡ diagnostika techeniĭ v suspenzii͡a︡kh i polimernykh rastvorakh

N. A. Pokryvaĭlo

1988229 pp.
O priblizhenii ėlektroneĭtralʹnosti v zadachakh ėlektrodiffuziiE. V. Nikolaev
⏱ 16m

O priblizhenii ėlektroneĭtralʹnosti v zadachakh ėlektrodiffuzii

E. V. Nikolaev

198916 pp.
Electronic diffusion and localization in disordered systemsGary Michael Scher
⏱ 2h 53m

Electronic diffusion and localization in disordered systems

Gary Michael Scher

1983173 pp.
Theory and practice of diffusion with an application to reaction kineticsStig Ljunggren
⏱ 12m

Theory and practice of diffusion with an application to reaction kinetics

Stig Ljunggren

196512 pp.
Isotope enrichment by countercurrent electromigration in molten saltsArnold Lundeń
⏱ 1h 54m

Isotope enrichment by countercurrent electromigration in molten salts

Arnold Lundeń

1956114 pp.
Electromigration and proton-Hall effect in metalhydridesAd H. Verbruggen
⏱ 2h 20m

Electromigration and proton-Hall effect in metalhydrides

Ad H. Verbruggen

1985140 pp.
Proceedings of the Symposium on Electromigration of Metals and First International Symposium on Multilevel Metallization and PackagingSymposium on Electromigration of Metals (1984 New Orleans, La.)
⏱ 3h 21m

Proceedings of the Symposium on Electromigration of Metals and First International Symposium on Multilevel Metallization and Packaging

Symposium on Electromigration of Metals (1984 New Orleans, La.)

1985201 pp.
Materials Reliability in Microelectronics V (Symposium Proceedings Series; Volume 391)A. S. Oates
⏱ 8h 43m

Materials Reliability in Microelectronics V (Symposium Proceedings Series; Volume 391)

A. S. Oates

1995523 pp.
Materials Reliability in Microelectronics IIIKenneth P. Rodbell
⏱ 8h 25m

Materials Reliability in Microelectronics III

Kenneth P. Rodbell

1993505 pp.
Electro-diffusion of ionsIsaak Rubinstein
⏱ 4h 14m

Electro-diffusion of ions

Isaak Rubinstein

1990254 pp.
Electro-Diffusion of Ions (Studies in Applied and Numerical Mathematics)Isaak Rubinstein
⏱ 4h 23m

Electro-Diffusion of Ions (Studies in Applied and Numerical Mathematics)

Isaak Rubinstein

1987263 pp.
The electromigration- and temperature-induced structural behavior of gold thin films based upon alkali additionsSusan Matts Goho
⏱ 2h 9m

The electromigration- and temperature-induced structural behavior of gold thin films based upon alkali additions

Susan Matts Goho

1983129 pp.
Advanced Ta-based diffusion barriers for Cu interconnectsUnknown Author
⏱ 1h 42m

Advanced Ta-based diffusion barriers for Cu interconnects

Unknown Author

2009102 pp.
Materials Reliability in Microelectronics IIC. V. Thompson
⏱ 5h 36m

Materials Reliability in Microelectronics II

C. V. Thompson

1992336 pp.
Advanced Ta-based diffusion barriers for Cu interconnectsRene Hubner

Advanced Ta-based diffusion barriers for Cu interconnects

Rene Hubner

2008No page data
Electromigration and electronic device degradationA. Christou
⏱ 5h 43m

Electromigration and electronic device degradation

A. Christou

1994343 pp.
Materials Reliability Issues in MicroelectronicsJ. R. Llyod
⏱ 5h 54m

Materials Reliability Issues in Microelectronics

J. R. Llyod

1991354 pp.
Termodynamiczne podstawy magnetotermodyfuzji i elektrotermodyfuzji w ośrodku ciągłymBogdan Maruszewski
⏱ 1h 7m

Termodynamiczne podstawy magnetotermodyfuzji i elektrotermodyfuzji w ośrodku ciągłym

Bogdan Maruszewski

198667 pp.
Electromigration in thin films and electronic devicesChoong-Un Kim
⏱ 5h 52m

Electromigration in thin films and electronic devices

Choong-Un Kim

2011352 pp.
Page 1 of 2Next →